Why was etching needed to

  1. In ion-assisted etching process, CHF3 is used in:Dry etching of silicon dioxide Dry etching of silicon nitride Wet etching of
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    2. MEMS asked by MEMS
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  2. How can the amount of copper-containing waste produced during the etching process be reduced?A. Increase the concentration of
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  3. Why was etching needed to bring out the grain boundaries?My answer: Is it for the light to bounce back?
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    2. Chemistry asked by Chemistry
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  4. How does a printed line from a woodcut differ from the printed line of an etching?a. The woodcut's line is thicker; the
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    2. ASL <3 asked by ASL <3
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  5. 3. How does a printed line from a woodcut differ from the printed line of an etching?O The woodcut's line is thicker; the
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  6. How does a printed line from a woodcut differ from the printed line of an etching?(1 point) Responses A. The woodcut’s line is
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    2. dale asked by dale
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  7. How does a printed line from a woodcut differ from the printed line of an etching?(1 point) Responses The woodcut’s line is
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    2. Kanna asked by Kanna
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  8. Reutter Company manufactures a single product and uses process costing. The company’s product goes through two processing
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    2. Tomi mathew asked by Tomi mathew
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  9. What happens to the copper chloride etching solution during the etching process?A. It becomes more acidic B. It becomes less
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  10. Substance. Properties before etching. PropertiesafterCopper. _________. _____ Copper chloride etching solution _____. _____
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