Question
In ion-assisted etching process, CHF3 is used in:
Dry etching of silicon dioxide
Dry etching of silicon nitride
Wet etching of silicon dioxide
Dry etching of silicon dioxide and silicon nitride
Dry etching of silicon dioxide
Dry etching of silicon nitride
Wet etching of silicon dioxide
Dry etching of silicon dioxide and silicon nitride
Answers
sharda tondare
what is correct answer?